Alkaline Polishing Additive BPL-719 Series

Alkaline Polishing Additive BPL-719 Series

Strong Cleaning Power

  • SunFonergy's alkaline additive can more effecitively remove wafer residues, resulting in a cleaner alkaline polishing process.

Strong Protection, More Uniform Surface

  • SunFonergy's additive can be used with both hot O3 (inline and batch type) and wet O3 processes. More uniform surface, smoother overlays among polishied pyramid bases.

Reduces Cost

  • Reduces the post-cleaning bath's alkaline chemical concentration and/or removes the post-cleaning step.


Alkaline Polishing Additive.pdf

Process Flow
Mono-Si Etching