Alkaline Polishing Additive BPLSeries

Strong Cleaning Power

• SunFonergy's alkaline additive can more effecitively remove wafer residues, resulting in a cleaner alkaline polishing process.

Strong Protection, More Uniform Surface

• SunFonergy's additive can be used with both hot O3 (inline and batch type) and wet O3 processes. More uniform surface, smoother overlays among polishied pyramid bases.

Reduces Cost

• Reduces the post-cleaning bath's alkaline chemical concentration and/or removes the post-cleaning step.

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Alkaline Polishing Additive.pdf