Mono-Si Texturization Additive MQT Series

It's suitable for Mono standard, Mono PERC and TOPCon.

Stable Performance, High Efficiency

• SunFonergy's Mono-Si texturization additive has stable cell performance throughout process lifetime, including high efficiency, stable reflectance, consistent etch weight, and uniform surface morphology.

Strong Cleaning Performance

• It has strong cleaning performance, especially for mixed wafer sources without SDR process as well as rework wafers. There is also no residue crystallization in the bath.

High Compatibility

• It is compatible with wafers with low SDR weight or no SDR process. Even with different tooling machines or wafer sources, SunFonergy's additive can be easily tuned for optimal efficiency.

Mono-Si Texturization Additive MQT Series

Stable Performance, High Efficiency

• SunFonergy's Mono-Si texturization additive has stable cell performance throughout process lifetime, including high efficiency, stable reflectance, consistent etch weight, and uniform surface morphology.

Strong Cleaning Performance

• It has strong cleaning performance, especially for mixed wafer sources without SDR process as well as rework wafers. There is also no residue crystallization in the bath.

High Compatibility

• It is compatible with wafers with low SDR weight or no SDR process. Even with different tooling machines or wafer sources, SunFonergy's additive can be easily tuned for optimal efficiency.

Mono-Si Texturization Additive MQT Series

Without Sharp-Edged Pyramids

• SunFonergy’s morphology pyramids achieve a more uniform surface without sharp corners; Lower reflectance.

Stable Performance, High Efficiency

• SunFonergy's Mono-Si texturization additive has stable cell performance throughout process lifetime, including high efficiency, stable reflectance, consistent etch weight, and uniform surface morphology.

Strong Cleaning Performance, High Compatibility

• It has strong cleaning performance, especially for mixed wafer sources without SDR process as well as rework wafers. There is also no residue crystallization in the bath.
• It is compatible with wafers with low SDR weight or no SDR process. Even with different tooling machines or wafer sources, SunFonergy’s additive can be easily tuned for optimal efficiency.