-
2013
·SunFonergy Founded -
2014
·R&D Mono-Si Texturization Additive
·Equipment Cleaner
·Slurry-Saw Cut Poly-Si Texturization Additive -
2015
·R&D DWS-Cut Poly-Si Texturization Additive
·Slurry-Saw Cut Poly-Si Technology v.2 -
2016
·Mono-Si Texturization Additive
·R&D Black Silicon Technology
·DWS-Cut Poly-Si Texturization Additive
·Slurry-Saw Cut Poly-Si Technology v.3 -
2017
·Mono-Si Texturization Additive v.2
·Application Black Silicon Technology
·DWS-Cut Poly-Si Texturization Additive v.2 -
2018
·R&D High-Efficiency PV Materials
·DWS-Cut Poly-Si Technology v.3
·Mono-Si Texturization Additive v.3 -
2019-2020
·Electronic Chemistry Clean Technology·Research High-Efficiency PV Materials·Upgrade DWS-Cut Poly-Si Technology·Upgrade Mono-Si Texturization Technology·Alkaline Polishing Technology·Acid Polishing Technology -
2021
·TOPCon: Wrap-around Remover, Texturing Additive·HJT: Reducing HNO3 Usage (additive), Texturing Additive·Upgrade Mono-Si Texturization Technology·Upgrade Alkaline Polishing Technology·High Efficiency Materials -
2022
·Upgrade Mono-Si Texturization Technology·Upgrade TOPCon Texturization Technology·HJT High-Efficiency cashmere making technology·Acid Polishing Technology·Alkaline Polishing Technology·Research High-Efficiency PV Materials·Electronic Chemistry Clean Technology
2013
·SunFonergy Founded
2014
·R&D Mono-Si Texturization Additive
·Equipment Cleaner
·Slurry-Saw Cut Poly-Si Texturization Additive
·Equipment Cleaner
·Slurry-Saw Cut Poly-Si Texturization Additive
2015
·R&D DWS-Cut Poly-Si Texturization Additive
·Slurry-Saw Cut Poly-Si Technology v.2
·Slurry-Saw Cut Poly-Si Technology v.2
2016
·Mono-Si Texturization Additive
·R&D Black Silicon Technology
·DWS-Cut Poly-Si Texturization Additive
·Slurry-Saw Cut Poly-Si Technology v.3
·R&D Black Silicon Technology
·DWS-Cut Poly-Si Texturization Additive
·Slurry-Saw Cut Poly-Si Technology v.3
2017
·Mono-Si Texturization Additive v.2
·Application Black Silicon Technology
·DWS-Cut Poly-Si Texturization Additive v.2
·Application Black Silicon Technology
·DWS-Cut Poly-Si Texturization Additive v.2
2018
·R&D High-Efficiency PV Materials
·DWS-Cut Poly-Si Technology v.3
·Mono-Si Texturization Additive v.3
·DWS-Cut Poly-Si Technology v.3
·Mono-Si Texturization Additive v.3
2019-2020
·Electronic Chemistry Clean Technology
·Research High-Efficiency PV Materials
·Upgrade DWS-Cut Poly-Si Technology
·Upgrade Mono-Si Texturization Technology
·Alkaline Polishing Technology
·Acid Polishing Technology
2021
·TOPCon: Wrap-around Remover, Texturing Additive
·HJT: Reducing HNO3 Usage (additive), Texturing Additive
·Upgrade Mono-Si Texturization Technology
·Upgrade Alkaline Polishing Technology
·High Efficiency Materials
2022
·Upgrade Mono-Si Texturization Technology
·Upgrade TOPCon Texturization Technology
·HJT High-Efficiency cashmere making technology
·Acid Polishing Technology
·Alkaline Polishing Technology
·Research High-Efficiency PV Materials
·Electronic Chemistry Clean Technology